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Lam Research通过干法光刻胶技术实现28nm间距的高分辨率图案化
Lam Research Corporation 今天宣布,其创新的干光刻胶技术已获得纳米电子和数字技术领域领先的研究和创新中心 imec 的认证,可直接印刷 2 纳米及以下的 28 纳米间距线路后端 (BEOL) ...
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